The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2021
Filed:
Feb. 27, 2018
Tokyo Electron Limited, Tokyo, JP;
Takashi Nagai, Koshi, JP;
Hideaki Sato, Koshi, JP;
Hiromi Hara, Koshi, JP;
Hiroshi Yoshida, Koshi, JP;
Tsukasa Hirayama, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate liquid processing apparatus includes a processing tubA which is configured to store therein a processing liquid in a boiling state and in which a processing of a substrateis performed by immersing the substrate in the stored processing liquid; a concentration sensorB configured to detect a concentration of a chemical liquid component contained in the processing liquid; a concentration control unit() configured to control the concentration of the chemical liquid component to a set concentration by adding the chemical liquid component or a diluting solution to the processing liquid based on a detection concentration of the concentration sensor; a head pressure sensorB configured to detect a head pressure of the processing liquid within the processing tub; and a concentration set value correction unitconfigured to correct, based on a detection value of the head pressure sensor, the set concentration.