Inventors with similar research interests:
Location History:
- Chakua, TW (1997)
- Chanwa, TW (1997)
- Chuwa, TW (1997)
- Chawa, TW (1998)
- Changwa, TW (1998)
- Chahwag, TW (1998)
- Chunwang, TW (1999)
- Chawang, TW (1999 - 2000)
- Chang-Hua, TW (2000 - 2002)
- Hsin-Chu, TW (1999 - 2006)
Company Filing History:
Years Active: 1997-2006
Title: Innovations by Tsu Shih: Pioneering Advances in CMP Technology
Introduction
Tsu Shih, a prominent inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of chemical mechanical polishing (CMP) with an impressive portfolio of 59 patents. His work is instrumental in enhancing the manufacturing processes of semiconductor devices, demonstrating a remarkable blend of innovation and practicality.
Latest Patents
Among Tsu Shih's latest patents are groundbreaking methods designed to improve polishing uniformity and surface smoothing in copper damascene processes. One notable patent is the "Method for Achieving Uniform CU CMP Polishing." This method outlines a technique for removing a metal oxide overlayer from a target polishing surface to enhance polishing uniformity. It involves the use of an oxide removal solution prior to the CMP process, as well as utilizing an abrasive slurry containing oxidizers and complexing agents to optimize the polishing process.
Another significant patent is the "Method for Copper Surface Smoothing," which describes an innovative improvement in the copper damascene process. This advancement includes projecting an electron beam onto a chemically polished material surface at a precise angle, allowing the electron beam's intensity and coverage to enhance the surface quality of copper-filled etched trenches.
Career Highlights
Tsu Shih has dedicated his professional career to pushing the boundaries of semiconductor fabrication technologies. He is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where his expertise and inventive spirit have contributed to the company's leading position in the global semiconductor market.
Collaborations
In his endeavors, Tsu Shih has collaborated with talented coworkers such as Syun-Ming Jang Jang and Ying-Ho Chen. These partnerships reflect a collaborative environment that is crucial for fostering innovation and advancing the field of semiconductor processing.
Conclusion
Tsu Shih's contributions through his numerous patents underscore his role as a key innovator within the semiconductor industry. His latest advancements in CMP technology not only enhance manufacturing processes but also set the groundwork for future innovations. As the industry continues to evolve, Tsu Shih remains a vital figure in shaping the future of semiconductor manufacturing.
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