The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2006
Filed:
Apr. 24, 2003
Applicants:
Han-hsin Kuo, Tainan, TW;
Hung-wen Su, Jubei, TW;
Wen-chih Chiou, Miaoli, TW;
Tsu Shih, Hsin-Chu, TW;
Hsien-ming Lee, Changhua, TW;
Inventors:
Han-Hsin Kuo, Tainan, TW;
Hung-Wen Su, Jubei, TW;
Wen-Chih Chiou, Miaoli, TW;
Tsu Shih, Hsin-Chu, TW;
Hsien-Ming Lee, Changhua, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
An improvement in a copper damascene process is disclosed. The improvement comprises the step of projecting an electron beam on to a chemical mechanically polished material surface having copper filled etched trenches at a known angle of incidence with respect to the material surface for a known period of time, the electron beam having a beamwidth substantially covering the material surface and a known intensity.