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For the Inventor, By the Inventor

Tainan, Taiwan

Han-Hsin Kuo

USPTO Granted Patents = 13

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 60(Granted Patents)


Company Filing History:

goldMedal13 out of 40,780 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2006-2018

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13 patents (USPTO):Explore Patents
1. 10062645 - Interconnect structure for semiconductor devices (2018-08-28),
2. 9723915 - Brush cleaning method (2017-08-08),
3. 9679848 - Interconnect structure for semiconductor devices (2017-06-13),
4. 9630295 - Mechanisms for removing debris from polishing pad (2017-04-25),
5. 9460997 - Interconnect structure for semiconductor devices (2016-10-04),
6. 9370854 - Method of fabricating a semiconductor device, and chemical mechanical polish tool (2016-06-21),
7. 9368452 - Metal conductor chemical mechanical polish (2016-06-14),
8. 9305880 - Interconnects for semiconductor devices (2016-04-05),
9. 9252060 - Reduction of OCD measurement noise by way of metal via slots (2016-02-02),
10. 9119464 - Brush cleaning system (2015-09-01),
11. 8673783 - Metal conductor chemical mechanical polish (2014-03-18),
12. 8361900 - Barrier layer for copper interconnect (2013-01-29),
13. 7091126 - Method for copper surface smoothing (2006-08-15),

Title: **Innovative Contributions of Han-Hsin Kuo in Semiconductor Technology**

Introduction

Han-Hsin Kuo is a prominent inventor based in Tainan, Taiwan. With a remarkable portfolio of 13 patents, he has made significant contributions to the field of semiconductor technology. His work is characterized by innovative approaches to improving the functionality and efficiency of semiconductor devices.

Latest Patents

Among his latest patents, Kuo has developed an interconnect structure for semiconductor devices. This involves a method of forming an interconnect by treating the upper surface of a dielectric layer to create a high-density layer. This treatment includes the use of various agents such as hexamethyldisilazane (HMDS), trimethylsilydiethylamine (TMSDEA), or trimethylsilylacetate (OTMSA). Following this treatment, the dielectric layer can be patterned to create openings, which are then filled with conductive material. The method also details the removal of excess conductive material through chemical mechanical polishing.

Additionally, Kuo has invented a brush cleaning method. This method includes inducing a static charge on a surface of a first plate made of silicon nitride (SiN) or silicon oxide (SiO). The technique involves rotating a brush in contact with the charged surface, showcasing Kuo's innovative approach to utilizing electrostatic principles in cleaning applications.

Career Highlights

Han-Hsin Kuo works at Taiwan Semiconductor Manufacturing Company Ltd., a leading player in the semiconductor industry. His career is highlighted by an unwavering commitment to enhancing the capabilities of semiconductor devices through innovative solutions. His patents reflect his expertise in developing advanced technologies that address existing challenges in the field.

Collaborations

Throughout his career, Kuo has collaborated with notable colleagues such as Fu-Ming Huang and Chi-Ming Tsai. These collaborations have played a vital role in fostering innovative developments and enhancing the research output of their team. Together, they have contributed to pushing the boundaries of semiconductor technology.

Conclusion

Han-Hsin Kuo's contributions to semiconductor technology highlight his innovative spirit and dedication to improving device functionality. With 13 patents to his name, his work continues to influence the industry and inspire future innovations. His achievements reflect the significant impact that inventive minds can have on advancing technology in today’s fast-paced world.

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