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For the Inventor, By the Inventor

Tokyo, Japan

Toshiyuki Oie

USPTO Granted Patents = 14

 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Tokyo, JP (2016 - 2020)
  • Katsushika-ku, JP (2021 - 2023)

Company Filing History:

goldMedal14 out of 2,245 
 
Mitsubishi Gas Chemical Company, Inc.
 patents

Years Active: 2016-2025

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14 patents (USPTO):Explore Patents
1. 12338381 - Protective fluid for alumina, protection method, and production method for semiconductor substrate having alumina layer using same (2025-06-24),
2. 11629315 - Aqueous composition and cleaning method using same (2023-04-18),
3. 11613720 - Aqueous composition and cleaning method using same (2023-03-28),
4. 11479744 - Composition having suppressed alumina damage and production method for semiconductor substrate using same (2022-10-25),
5. 11352593 - Aqueous composition and cleaning method using same (2022-06-07),
6. 11193094 - Liquid composition for reducing damage of cobalt, alumina, interlayer insulating film and silicon nitride, and washing method using same (2021-12-07),
7. 10689573 - Wet etching composition for substrate having SiN layer and Si layer and wet etching method using same (2020-06-23),
8. 10651028 - Semiconductor element cleaning solution that suppresses damage to tungsten-containing materials, and method for cleaning semiconductor element using same (2020-05-12),
9. 10629426 - Semiconductor element cleaning solution that suppresses damage to cobalt, and method for cleaning semiconductor element using same (2020-04-21),
10. 10538718 - Cleaning solution and cleaning method for material comprising carbon-incorporated silicon oxide for use in recycling wafer (2020-01-21),
11. 10377978 - Alkaline earth metal-containing cleaning solution for cleaning semiconductor element, and method for cleaning semiconductor element using same (2019-08-13),
12. 10160938 - Semiconductor element cleaning solution that suppresses damage to tantalum-containing materials, and cleaning method using same (2018-12-25),
13. 10035978 - Semiconductor element cleaning liquid and cleaning method (2018-07-31),
14. 9422512 - Cleaning liquid for semiconductor elements and cleaning method using same (2016-08-23),

Title: Innovations of Toshiyuki Oie in Semiconductor Technology

Introduction

Toshiyuki Oie is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work focuses on developing protective fluids and methods that enhance the production processes of semiconductor substrates.

Latest Patents

One of Oie's latest patents is a protective fluid for alumina, which includes a protection method and a production method for semiconductor substrates that utilize an alumina layer. This invention is characterized by containing 0.0001%-20% by mass of an alkali earth metal compound, with the alkali earth metal being selected from beryllium, magnesium, strontium, and barium. This innovative protective fluid effectively suppresses alumina corrosion during the production of semiconductor circuits. Another notable patent involves an aqueous composition that includes specific compounds and acids, aimed at improving cleaning methods in semiconductor manufacturing.

Career Highlights

Oie is currently employed at Mitsubishi Gas Chemical Company, Inc., where he continues to advance his research and development efforts in semiconductor technology. His work has been instrumental in addressing challenges faced in the production of semiconductor devices.

Collaborations

Throughout his career, Oie has collaborated with notable colleagues, including Kenji Shimada and Akinobu Horita. These partnerships have fostered innovation and contributed to the success of various projects in the semiconductor field.

Conclusion

Toshiyuki Oie's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes.

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