The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2025

Filed:

Feb. 27, 2019
Applicant:

Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;

Inventors:

Toshiyuki Oie, Katsushika-ku, JP;

Priangga Perdana Putra, Katsushika-ku, JP;

Akinobu Horita, Katsushika-ku, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 15/02 (2006.01); B05D 5/00 (2006.01); C01F 7/021 (2022.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C09K 15/02 (2013.01); B05D 5/00 (2013.01); C01F 7/021 (2013.01); H01L 21/0206 (2013.01);
Abstract

The present invention pertains to a protective fluid for alumina, a protection method, and a production method for semiconductor substrate having an alumina layer using same. This alumina protective fluid is characterized by: containing 0.0001%-20% by mass of an alkali earth metal compound; and the alkali earth metal being at least one selected from the group consisting of beryllium, magnesium, strontium, and barium. As a result of the present invention, alumina corrosion can be suppressed during the production process for semiconductor circuits.


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