The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Oct. 02, 2015
Applicant:
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Inventors:
Toshiyuki Oie, Tokyo, JP;
Kenji Shimada, Tokyo, JP;
Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC., Chiyoda-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C11D 7/10 (2006.01); C11D 7/32 (2006.01); C11D 7/12 (2006.01); C11D 7/06 (2006.01); H01L 21/311 (2006.01); C11D 7/04 (2006.01); C11D 7/08 (2006.01); C11D 11/00 (2006.01); H01L 21/306 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02041 (2013.01); C11D 7/04 (2013.01); C11D 7/06 (2013.01); C11D 7/08 (2013.01); C11D 7/10 (2013.01); C11D 7/105 (2013.01); C11D 7/12 (2013.01); C11D 7/32 (2013.01); C11D 7/3209 (2013.01); C11D 7/3218 (2013.01); C11D 7/3281 (2013.01); C11D 11/0047 (2013.01); H01L 21/0206 (2013.01); H01L 21/02063 (2013.01); H01L 21/308 (2013.01); H01L 21/30604 (2013.01); H01L 21/31133 (2013.01);
Abstract
According to the present invention, it is possible to provide a cleaning solution which removes a dry etching residue on a surface of a semiconductor element that includes: (1) a material containing cobalt or a cobalt alloy or (2) a material containing cobalt or a cobalt alloy and tungsten; and a low-dielectric constant interlayer dielectric film. The cleaning solution contains 0.001-7 mass % of an alkali metal compound, 0.005-35 mass % of a peroxide, 0.005-10 mass % of an anti-corrosion agent, 0.000001-1 mass % of an alkaline earth metal compound, and water.