logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10629426 B1

PDFFull Text
Date of Patent:
Apr. 21, 2020

Filed:

Oct. 02, 2015

Semiconductor element cleaning solution that suppresses damage to cobalt, and method for cleaning semiconductor element using same

Applicant:

Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;

Inventors:

Toshiyuki Oie, Tokyo, JP;

Kenji Shimada, Tokyo, JP;

Assignee:

MITSUBISHI GAS CHEMICAL COMPANY, INC., Chiyoda-ku, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
H01L 21/02 (2006.01); C11D 7/10 (2006.01); C11D 7/32 (2006.01); C11D 7/12 (2006.01); C11D 7/06 (2006.01); H01L 21/311 (2006.01); C11D 7/04 (2006.01); C11D 7/08 (2006.01); C11D 11/00 (2006.01); H01L 21/306 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02041 (2013.01); C11D 7/04 (2013.01); C11D 7/06 (2013.01); C11D 7/08 (2013.01); C11D 7/10 (2013.01); C11D 7/105 (2013.01); C11D 7/12 (2013.01); C11D 7/32 (2013.01); C11D 7/3209 (2013.01); C11D 7/3218 (2013.01); C11D 7/3281 (2013.01); C11D 11/0047 (2013.01); H01L 21/0206 (2013.01); H01L 21/02063 (2013.01); H01L 21/308 (2013.01); H01L 21/30604 (2013.01); H01L 21/31133 (2013.01);
Abstract

According to the present invention, it is possible to provide a cleaning solution which removes a dry etching residue on a surface of a semiconductor element that includes: (1) a material containing cobalt or a cobalt alloy or (2) a material containing cobalt or a cobalt alloy and tungsten; and a low-dielectric constant interlayer dielectric film. The cleaning solution contains 0.001-7 mass % of an alkali metal compound, 0.005-35 mass % of a peroxide, 0.005-10 mass % of an anti-corrosion agent, 0.000001-1 mass % of an alkaline earth metal compound, and water.

Find Patent Forward Citations

Oie, Toshiyuki. (2020). Semiconductor element cleaning solution that suppresses damage to cobalt, and method for cleaning semiconductor element using same (U.S. Patent No. 10629426). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10629426

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…