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Hwaseong-si, South Korea

Toshihisa Ozu

USPTO Granted Patents = 10

EPO Patents = 1

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 10(Granted Patents)

Location History:

Miyagi, JP (2014 - 2015)
Hyogo, JP (2014 - 2015)
Hwaseong-si, KR (2015 - 2017)
Hwaseong, KR (2016 - 2017)
Amagasaki, JP (2014 - 2019)

Company Filing History:

10 out of 10,295

Tokyo Electron Limited

Years Active: 2014-2019

where 'Filed Patents' based on already Granted Patents

10 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10224220 - Plasma processing apparatus and plasma etching apparatus (2019-03-05),

2. 9728417 - Method for processing base body to be processed (2017-08-08),

3. 9711371 - Method of etching organic film (2017-07-18),

4. 9337020 - Resist mask processing method using hydrogen containing plasma (2016-05-10),

5. 9034698 - Semiconductor device manufacturing method (2015-05-19),

6. 8980048 - Plasma etching apparatus (2015-03-17),

7. 8969210 - Plasma etching apparatus, plasma etching method, and semiconductor device manufacturing method (2015-03-03),

8. 8835320 - Etching method and device (2014-09-16),

9. 8771537 - Plasma treatment device and plasma treatment method (2014-07-08),

10. 8753527 - Plasma etching method and plasma etching apparatus (2014-06-17),

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