Company Filing History:
Years Active: 2011-2015
Title: Innovations of Toshihide Endoh
Introduction
Toshihide Endoh is a prominent inventor based in Suzuka, Japan. He has made significant contributions to the field of polycrystalline silicon manufacturing, holding a total of 12 patents. His work has been instrumental in advancing technologies that are crucial for the semiconductor industry.
Latest Patents
One of his latest inventions is a reactor cleaning apparatus designed to clean the inner wall surface of a reactor that generates polycrystalline silicon. This apparatus features a dual-structured bell jar and a unique tray with a through hole, allowing for efficient cleaning with a high-pressure nozzle device. Another notable patent is for a manufacturing apparatus of polycrystalline silicon, which involves a seed rod holding member made of conductive material. This innovative design allows for the effective deposition of polycrystalline silicon on silicon seed rods.
Career Highlights
Toshihide Endoh has dedicated his career to improving manufacturing processes within the semiconductor industry. His work at Mitsubishi Materials Corporation has positioned him as a key figure in the development of advanced technologies for silicon production.
Collaborations
Throughout his career, Endoh has collaborated with notable colleagues, including Toshiyuki Ishii and Masaaki Sakaguchi. These partnerships have fostered innovation and contributed to the success of their projects.
Conclusion
Toshihide Endoh's contributions to the field of polycrystalline silicon manufacturing are noteworthy. His innovative patents and collaborative efforts continue to influence the industry positively.