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For the Inventor, By the Inventor

Nirasaki, Japan

Tetsuya Miyashita

This inventor holds 24 USPTO granted patents and 5 published patent applications, primarily in Substrate Processing. Top assignee: Tokyo Electron Limited. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tetsuya Miyashita. Retrieved from https://idiyas.com/inventor/tetsuya-miyashita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 70(Granted Patents)


Location History:

  • Nirasaki, JP (2016 - 2022)
  • Yamanashi, JP (2015 - 2024)

Company Filing History:

goldMedal24 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2015-2026

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Areas of Expertise:
Film Forming Apparatus
Substrate Processing
Sputtering Apparatus
Vacuum Transfer Device
Abnormality Detection
PVD Processing
Cooling Processing
Mounting Table System
Load Lock Device
Gate Valve Unit
Temperature Control
Substrate Transfer
24 patents (USPTO):Explore Patents
1. 12559835 - Film forming apparatus and film forming method (2026-02-24),
2. 12469723 - Substrate processing apparatus and abnormality detection method (2025-11-11),
3. 12327744 - Substrate transfer device and substrate processing system (2025-06-10),
4. 12261078 - Processing method and processing apparatus (2025-03-25),
5. 12211720 - Vacuum transfer device, substrate processing system, and substrate processing method (2025-01-28),
6. 12170217 - Substrate processing apparatus and abnormality detection method (2024-12-17),
7. 12163215 - Film forming apparatus and film forming method (2024-12-10),
8. 12033878 - Substrate transfer apparatus and substrate processing system (2024-07-09),
9. 12002667 - Sputtering apparatus and method of controlling sputtering apparatus (2024-06-04),
10. 11901166 - Magnetron sputtering apparatus and magnetron sputtering method (2024-02-13),
11. 11823879 - Film formation apparatus and film formation method (2023-11-21),
12. 11764092 - Substrate transfer apparatus and substrate processing system (2023-09-19),
13. 11542592 - Film forming system and method for forming film on substrate (2023-01-03),
14. 11410837 - Film-forming device (2022-08-09),
15. 11193200 - PVD processing method and PVD processing apparatus (2021-12-07),

Title: Tetsuya Miyashita - Innovative Inventor from Nirasaki, Japan

Introduction: Tetsuya Miyashita is a renowned inventor hailing from Nirasaki, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Tetsuya Miyashita holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Miyashita has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Tetsuya Miyashita has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge-sharing.

Conclusion: Tetsuya Miyashita's passion for innovation and his relentless drive to push the boundaries of what is possible make him a true pioneer in the world of inventions, inspiring the next generation of inventors to dream big and create a better future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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