The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2023

Filed:

Jan. 11, 2022
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Masato Shinada, Tokyo, JP;

Tetsuya Miyashita, Yamanashi, JP;

Naoki Watanabe, Yamanashi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3429 (2013.01); C23C 14/3464 (2013.01); H01J 37/3435 (2013.01); H01J 37/3441 (2013.01); H01J 37/3447 (2013.01); H01J 2237/332 (2013.01);
Abstract

There is provided a film formation apparatus which forms a film on a substrate by sputtering. The apparatus comprises: a substrate holder configured to hold the substrate; and a plurality of cathodes configured to hold targets that emit sputtered particles, and connected to a power supply. At least one of the plurality of cathodes holds the targets of a plurality of types.


Find Patent Forward Citations

Loading…