Tokyo, Japan

Masato Shinada

USPTO Granted Patents = 14 

Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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14 patents (USPTO):Explore Patents

Title: The Innovations of Masato Shinada: A Pioneer in Substrate Processing

Introduction

Masato Shinada, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of substrate processing technology. With a total of 11 patents to his name, Shinada's inventions are paving the way for advancements in various industrial applications.

Latest Patents

One of his latest patents is a processing method and processing apparatus designed for efficiently managing a substrate. This innovative method includes a series of strategic steps: a first arrangement step for mounting a protective member onto a processing stage; an adjustment step to modify the distance between the stage and a cover member; and a pretreatment step to change the conditions within the processing container. Impressively, the protective member is designed with a different thickness than that of the substrate, adding a layer of complexity to the technology.

Another notable patent involves a sputtering apparatus and a method for controlling it. This apparatus features a target that emits sputtered particles, along with a substrate support and a substrate moving mechanism for enhanced operation. A unique aspect of this invention is its shielding member, which consists of two vertically arranged shielding members, ensuring that the sputtered particles pass through an opening to optimize processing efficiency.

Career Highlights

Throughout his career, Masato Shinada has worked with notable companies, including Tokyo Electron Limited, where he has further developed his inventive strategies and methodologies. His expertise in substrate processing has been critical in advancing the technologies associated with the electronics and semiconductor industries.

Collaborations

Shinada's innovative journey has been enriched through collaborations with esteemed coworkers, such as Hiroyuki Toshima and Einstein Noel Abarra. Their joint efforts have contributed to the successful development and implementation of advanced processing technologies that continue to influence the industry.

Conclusion

Masato Shinada stands out as a remarkable inventor in Tokyo, with a prolific portfolio of patents that demonstrate his commitment to innovation. His recent breakthroughs in processing methods and apparatuses underscore his pivotal role in shaping the future of substrate processing technology. As his work continues to evolve, the impact of his inventions will undoubtedly be felt across various sectors, driving further advancements in the field.

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