The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Nov. 13, 2024
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Masato Shinada, Fuchu, JP;

Einstein Noel Abarra, Fuchu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32651 (2013.01); C23C 14/35 (2013.01); H01J 37/32522 (2013.01); H01J 37/3405 (2013.01); H01J 2237/332 (2013.01);
Abstract

A substrate processing apparatus includes: a processing container; a temperature adjustment structure including a flow path inside a sidewall of the processing container; a shield member installed in the processing container so as to be adjacent to the flow path; a conductive member installed between the shield member and the sidewall in which the flow path is located; a buffer member having conductivity and interposed between the shield member and the conductive member; and a plurality of fixing members installed between the sidewall and the conductive member, having elasticity and conductivity, and configured to fix the conductive member so that the conductive member is pressed against the shield member.


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