This inventor holds 39 USPTO granted patents, primarily in Plasma Processing. Top assignees: Hitachi, Ltd., Hitachi-High-Technologies Corporation, Opnext Japan, Inc.. Active years: 1976-2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Kokubunji, JA (1976)
- Hachioji, JA (1977)
- Kanagawa, JA (1978)
- Kudamatsu, JP (1992)
- Yamaguchi, JP (2005)
- Tokuyama, JP (1994 - 2008)
Company Filing History:
35 out of 42,731 
4 out of 2,874 
1 out of 134 Years Active: 1976-2008
Areas of Expertise:
Title: Tetsunori Kaji: Innovator in Plasma Processing Technologies
Introduction
Tetsunori Kaji is a distinguished inventor based in Tokuyama, Japan, known for his significant contributions to the field of plasma processing. With a remarkable portfolio of 39 patents, Kaji has played a pivotal role in advancing technologies that leverage emission spectroscopy for various applications.
Latest Patents
Among Tetsunori Kaji's latest innovations are two notable patents. The first is an "Emission Spectroscopic Processing Apparatus and Plasma Processing Method Using It." This invention describes a sophisticated plasma processing method that utilizes a spectroscopic processing unit. It is designed to separate spectrally emitted plasma radiation from a vacuum process chamber into component spectra, which are then converted into time series of analog electric signals. This method enhances the ability to monitor and control the plasma processing by determining the endpoint of the process based on digital signal analysis.
His second latest patent focuses on the "Film Thickness Measuring Method of Member to be Processed Using Emission Spectroscopy." This system includes a film thickness measuring apparatus that evaluates the thickness of a member during processing. It comprises a data base holding a standard pattern of time differential values of interference light intensities across multiple wavelengths. By analyzing these patterns, the apparatus can accurately determine the processed amount of the film, thus optimizing the manufacturing process.
Career Highlights
Tetsunori Kaji's career has seen him collaborate with esteemed companies, notably Hitachi Ltd and Hitachi High-Technologies Corporation. These experiences provided him with the foundation to explore innovative solutions in the realm of plasma processing and emission spectroscopy.
Collaborations
Kaji has worked alongside notable peers, including Takashi Fujii and Tatehito Usui. Their collaborative efforts have contributed to the advancement of technologies that continue to push the boundaries of what is possible in plasma processing and measurement techniques.
Conclusion
Through his inventive spirit and technical expertise, Tetsunori Kaji has established himself as a leading figure in the field of plasma processing. His patents reflect a commitment to innovation and excellence, setting new standards for efficiency and precision in technological applications. As he continues to advance the field, the impact of his work will undoubtedly resonate within the industry for years to come.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile