The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2008
Filed:
Jun. 07, 2007
Tatehito Usui, Chiyoda, JP;
Takashi Fujii, Kudamatsu, JP;
Motohiko Yoshigai, Hikari, JP;
Tetsunori Kaji, Tokuyama, JP;
Tatehito Usui, Chiyoda, JP;
Takashi Fujii, Kudamatsu, JP;
Motohiko Yoshigai, Hikari, JP;
Tetsunori Kaji, Tokuyama, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A system including: a film thickness measuring apparatus for measuring a film thickness of a member to be processed, including: a differential waveform pattern data base for holding a standard pattern consisting of a time differential value of an interference light for each of multiple wavelengths with respect to a film thickness of a first member to be processed; a unit for measuring an intensity of an interference light for each of multiple wavelengths of a second member to be processed; a unit for obtaining a real pattern consisting of time differential values of measured interference light intensities; and a unit for determining a processed amount of the film by using a pattern of zero-cross points of the differential values of intensities of the received interference light for a second wavelength among the received interference lights of the multiple wavelengths.