The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
May. 05, 2000
Tetsunori Kaji, Tokuyama, JP;
Shinichi Tachi, Sayama, JP;
Toru Otsubo, Fujisawa, JP;
Katsuya Watanabe, Kudamatsu, JP;
Katsuhiko Mitani, Hikari, JP;
Junichi Tanaka, Chiyoda-machi, JP;
Tetsunori Kaji, Tokuyama, JP;
Shinichi Tachi, Sayama, JP;
Toru Otsubo, Fujisawa, JP;
Katsuya Watanabe, Kudamatsu, JP;
Katsuhiko Mitani, Hikari, JP;
Junichi Tanaka, Chiyoda-machi, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of plasma-processing is provided which includes placing a sample on one of electrodes provided in a vacuum processing chamber and holding the sample onto the electrodes by an electrostatic attracting force. A processing gas is introduced into an environment in which said sample is placed, and the environment is evacuated to a pressure condition for processing said sample. The processing gas is then formed into a plasma under the pressure condition, the sample is processed by the plasma, and a pulse bias voltage having a pulse cycle of 0.1 μm to 10 μm is applied to the sample.