Nishitama, Japan

Terunori Warabisako

This inventor holds 18 USPTO granted patents and 1 published patent application, primarily in Semiconductor Technology. Top assignees: Hitachi, Ltd., Advanced Lcd Technologies Development Center Co., Ltd.. Active years: 1982-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Terunori Warabisako. Retrieved from https://idiyas.com/inventor/terunori-warabisako

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 18 

% Patents Active = 83.3

Average Co-Inventor Count = 4.6

ph-index = 11

Forward Citations = 561(Granted Patents)


Location History:

  • Nishitama, JP (1986 - 1991)
  • Tokyo, JP (1982 - 2001)
  • Nishitama-gun, JP (2001 - 2009)

Company Filing History:


Years Active: 1982-2009

Loading Chart...
Areas of Expertise:
Thin-Film Transistor
Photovoltaic Module
Semiconductor Device
Light Concentrator
Memory Device
Plasma Treatment
Solid Phase Epitaxy
Microbridges
Ion Implantation
Light Receiving Element
Film Formation
CMOS Technology
18 patents (USPTO):Explore Patents

Title: Terunori Warabisako: Innovator in Thin-Film Transistor Technology

Introduction

Terunori Warabisako is a prominent inventor based in Nishitama-gun, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of thin-film transistors. With a total of 18 patents to his name, Warabisako has established himself as a key figure in innovation within this domain.

Latest Patents

Among his latest patents are advancements in thin-film transistors, methods for manufacturing these transistors, and displays utilizing thin-film transistors. His inventions focus on providing a thin-film transistor that offers higher electron or hole mobility. The method for manufacturing the thin-film transistor involves a semiconductor thin film with a crystal grown in a horizontal direction. This design includes a source region, a channel region, and a drain region, with a gate insulating film and a gate electrode positioned over the channel region. Notably, the drain edge of the drain region, adjacent to the channel region, is formed near the crystal growth end position. Additionally, he has developed a method for manufacturing semiconductor devices that includes irradiating a non-monocrystalline semiconductor film with a laser beam to crystallize the region, followed by heating the crystallized area with light from a flash lamp.

Career Highlights

Warabisako has worked with notable companies such as Hitachi, Ltd. and Advanced LCD Technologies Development Center Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Some of his notable coworkers include Masanobu Miyao and Hideo Sunami, who have collaborated with him on various projects in the field of semiconductor technology.

Conclusion

Terunori Warabisako's contributions to thin-film transistor technology and his extensive patent portfolio highlight his role as an influential inventor in the semiconductor industry. His work continues to impact the development of advanced electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…