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For the Inventor, By the Inventor

Kamakura, Japan

Teruaki Okino

USPTO Granted Patents = 37

Average Co-Inventor Count = 1.3

ph-index = 10

Forward Citations = 331(Granted Patents)


Location History:

  • Kanagawa-ken, JP (1996 - 1999)
  • Kamakur, JP (1999)
  • Kamakura, JP (1998 - 2005)
  • Kamahura-chi, JP (2005)

Company Filing History:

goldMedal37 out of 8,889 
 
Nikon Corporation
 patents

Years Active: 1996-2005

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37 patents (USPTO):
1. 6936831 - Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same (2005-08-30),
2. 6894291 - Apparatus and methods for blocking highly scattered charged particles in a patterned beam in a charged-particle-beam microlithography system (2005-05-17),
3. 6815693 - Charged-particle-beam microlithography apparatus and methods including proximity-effect correction (2004-11-09),
4. 6680481 - Mark-detection methods and charged-particle-beam microlithography methods and apparatus comprising same (2004-01-20),
5. 6664551 - Methods for detecting incidence orthogonality of a patterned beam in charged-particle-beam (CPB) microlithography, and CPB microlithography systems that perform same (2003-12-16),
6. 6657207 - Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposures (2003-12-02),
7. 6541169 - Methods for charged-particle-beam microlithography including correction of deflection aberrations, and device-manufacturing methods comprising same (2003-04-01),
8. 6447964 - Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrate (2002-09-10),
9. 6376137 - Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector (2002-04-23),
10. 6362489 - Charged-particle-beam microlithography methods exhibiting reduced thermal deformation of mark-defining member (2002-03-26),
11. 6307209 - Pattern-transfer method and apparatus (2001-10-23),
12. 6277542 - Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density (2001-08-21),
13. 6258511 - Charged particle beam exposure method utilizing partial exposure stitch area (2001-07-10),
14. 6207962 - Charged-particle-beam microlithography apparatus and methods exhibiting reduced thermal deformation of mark-defining member (2001-03-27),
15. 6194732 - Charged-particle-beam exposure methods with beam parallelism detection and correction (2001-02-27),

Title: Teruaki Okino - Innovative Inventor from Kamakura, JP

Introduction: Teruaki Okino is a renowned inventor hailing from the picturesque city of Kamakura, Japan. With a passion for creating groundbreaking technologies, he has made significant contributions to the field of innovation.

Latest Patents: Teruaki Okino holds several patents in various technological domains, showcasing his versatility and ingenuity in inventing cutting-edge solutions for real-world problems.

Career Highlights: Throughout his illustrious career, Teruaki Okino has been at the forefront of technological advancements. His innovative spirit and dedication have led to the development of revolutionary products that have impacted industries worldwide.

Collaborations: Teruaki Okino has collaborated with leading research institutions, universities, and companies to further his inventions. His ability to work in multidisciplinary teams has resulted in the successful implementation of his groundbreaking ideas.

Conclusion: Teruaki Okino's relentless pursuit of innovation and his remarkable contributions to the world of inventions make him a true visionary. His work continues to inspire aspiring inventors and shape the future of technology.

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