The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2005
Filed:
May. 17, 2001
Tomoharu Fujiwara, Ageo, JP;
Noriyuki Hirayanagi, Tokyo, JP;
Kazuaki Suzuki, Tokyo, JP;
Teruaki Okino, Kamakura, JP;
Tomoharu Fujiwara, Ageo, JP;
Noriyuki Hirayanagi, Tokyo, JP;
Kazuaki Suzuki, Tokyo, JP;
Teruaki Okino, Kamakura, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Reticles and apparatus for performing charged-particle-beam microlithography, and associated methods, are disclosed, in which the pattern to be transferred to a sensitive substrate is divided according to any of various schemes serving to improve throughput and pattern-transfer accuracy. The methods and apparatus are especially useful whenever a divided stencil reticle is used that includes complementary pattern portions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile