The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Dec. 28, 1998
Teruaki Okino, Kamakura, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Methods are disclosed for transferring a pattern from a mask to a sensitive substrate. The mask is illuminated substantially orthogonally with a charged particle beam propagating along an optical axis. An image of the charged particle beam that has passed through the mask is projection-exposed onto the substrate. At multiple locations displaced from each other in the optical-axis direction, a size measurement is obtained on a transverse profile of the beam as incident on at least one of the mask and substrate. From the size measurements, a respective parallelism of the beam incident to the mask and/or substrate is determined. From these determinations, the parallelism of the beam relative to the mask and/or substrate is adjusted as required.