The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2003
Filed:
Oct. 02, 2002
Teruaki Okino, Kamakura, JP;
Nikon Corporation, Tokyo, JP;
Abstract
In the context of charged-particle-beam (CPB) microlithography methods and systems, methods are disclosed for detecting the incidence orthogonality of a patterned beam on the lithographic substrate. In an embodiment, the position of reticle-fiducial-mark images, as formed on the substrate stage at a position Z are detected at two lateral positions of a corresponding reticle fiducial mark. A distance L between the images is determined. Then, the substrate stage is moved to a position Z at which the position of reticle-fiducial-mark images are detected at two lateral positions of the corresponding reticle fiducial mark. A distance L between the images is determined. The incidence-orthogonality error &Dgr;&thgr; is calculated by substitution into &Dgr;&thgr;=(L −L )/2&Dgr;H. The projection-optical system of the CPB microlithography apparatus is adjusted so that &Dgr;&thgr;=0.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile