The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Feb. 20, 2001
Nikon Corporation, Tokyo, JP;
Abstract
Methods are disclosed for correcting proximity effects as affected by varying magnitudes of beam blur occurring at different respective locations in an image of a reticle subfield as projected onto the sensitive surface of a substrate. Local resizings of pattern-element profiles as defined on the reticle are made taking into consideration not only proximity effects arising from Coulomb interactions but also different magnitudes of beam blur occurring at different respective locations in a projected subfield. Beam blur is imparted by the projection-optical system and is a function of the magnitude of beam deflection, the location of pattern element(s) within the area of the exposed subfield, and the exposure-energy profile on the surface of the substrate being exposed. A resist-development energy threshold is established such that the edges of pattern elements as transferred to the wafer in response to the exposure-energy profile will be at their desired locations according to design specifications. The corresponding elements as defined on the reticle are adjusted accordingly so that their linewidths as projected will be within design specifications.