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Kumagaya, Japan

Koichi Kamijo

USPTO Granted Patents = 13

Average Co-Inventor Count = 1.5

ph-index = 4

Forward Citations = 59(Granted Patents)

Location History:

Saitama, JP (2003)
Kawasaki, JP (2001 - 2004)
Kumagaya, JP (2002 - 2004)

Company Filing History:

13 out of 8,891

Nikon Corporation

Years Active: 2001-2004

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6830852 - Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles (2004-12-14),

2. 6815693 - Charged-particle-beam microlithography apparatus and methods including proximity-effect correction (2004-11-09),

3. 6654106 - Methods and apparatus for determining blur of an optical system (2003-11-25),

4. 6642532 - Methods for determining a pattern on a microlithography reticle to minimize proximity effects in pattern elements in chips located on substrate periphery (2003-11-04),

5. 6635881 - Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same (2003-10-21),

6. 6566663 - Charged-particle-beam optical components and systems including ferrite exhibiting reduced image displacement from temperature fluctuations (2003-05-20),

7. 6531251 - Proximity effect correction methods (2003-03-11),

8. 6507027 - Apparatus and methods for charged-particle-beam microlithography exhibiting reduced four-fold aberrations (2003-01-14),

9. 6501083 - Methods for calculating cumulative dose of exposure energy from regions of a microlithography reticle for use in correcting proximity effects (2002-12-31),

10. 6489620 - Astigmatism-correction device and charged-particle-beam microlithography apparatus and methods comprising same (2002-12-03),

11. 6432594 - Devices for reducing deflection aberrations in charged-particle-beam optical systems and microlithography apparatus comprising same, and related methods (2002-08-13),

12. 6255663 - Charged particle beam exposure apparatus and semiconductor device manufacturing method (2001-07-03),

13. 6194102 - Pattern-transfer methods and masks (2001-02-27),

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