The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2001
Filed:
Oct. 14, 1999
Teruaki Okino, Kamakura, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure method using a charged particle beam is used to improve the accuracy of stitching the patterns according to the divided pattern transfer. The exposure method according to the present invention comprises dividing the pattern into a plurality of subfields arranged in stripes; forming the subfields (,L) and (,R) laid around the boundary in the adjacent stripes (,L) and (,R), exposing the subfields (,L) and (,R) by half the exposure time amount, and overlapping the images of the patterns of the subfields (,L) and (,R) at substantially the same position on the wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile