Nirasaki, Japan

Tatsuya Miyahara

USPTO Granted Patents = 8 

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Nirasaki, JP (2022 - 2023)
  • Yamanashi, JP (2021 - 2024)

Company Filing History:


Years Active: 2021-2025

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8 patents (USPTO):Explore Patents

Title: Tatsuya Miyahara: Innovator in Gas Processing Technologies

Introduction

Tatsuya Miyahara is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of gas processing technologies, holding a total of 8 patents. His work focuses on methods that enhance the efficiency and reliability of gas supply systems.

Latest Patents

Miyahara's latest patents include an "Abnormality Detection Method and Processing Apparatus." This innovative method involves supplying gas at a controlled rate to a gas supply pipe, measuring the pressure inside the gas pipe, and detecting abnormalities based on the measured pressure. Another notable patent is the "Film Deposition Method and Method for Forming Polycrystalline Silicon Film." This method outlines the process of depositing an amorphous silicon film on a substrate under specific temperature and pressure conditions.

Career Highlights

Tatsuya Miyahara is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His expertise in gas processing technologies has positioned him as a valuable asset to the company.

Collaborations

Miyahara has collaborated with notable coworkers, including Yoshihiro Takezawa and Daisuke Suzuki. Their combined efforts contribute to the advancement of innovative technologies in their field.

Conclusion

Tatsuya Miyahara's contributions to gas processing technologies and his impressive portfolio of patents highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing and related fields.

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