Osaka, Japan

Takeshi Shimada

This inventor holds 43 USPTO granted patents and 6 published patent applications and 7 EPO patents, primarily in Thermoelectric Materials. Top assignees: Hitachi Metals, Ltd., Hitachi-High-Technologies Corporation, Nintendo Co., Ltd.. Active years: 2001-2024.

USPTO Granted Patents = 43 

% Patents Active = 51.2

 

Average Co-Inventor Count = 2.8

ph-index = 4

Forward Citations = 59(Granted Patents)


Location History:

  • Ukyo-ku Kyoto, JP (2004)
  • Saitama, JP (2011)
  • Osaka, JP (2010 - 2015)
  • Hikari, JP (2005 - 2016)
  • Kyoto, JP (2001 - 2020)
  • Tokyo, JP (2010 - 2024)

Company Filing History:


Years Active: 2001-2024

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Areas of Expertise:
Thermoelectric Conversion
Plasma Processing
Semiconductor Composition
Thermoelectric Module
Plasma Etching
Dielectric Porcelain
Single Crystal Material
Magnetoresistive Element
LED Vehicular Lamp
Information Processing
Vacuum Processing
Ceramic Composition
43 patents (USPTO):Explore Patents

Title: **Innovations of Takeshi Shimada: A Leader in Thermoelectric and Plasma Processing Technologies**

Introduction

Takeshi Shimada, based in Osaka, Japan, is a prolific inventor with an impressive portfolio of 41 patents. His work primarily focuses on thermoelectric conversion materials and advanced plasma processing techniques. As a thought leader in his field, Shimada's contributions have significant implications for energy efficiency and semiconductor fabrication.

Latest Patents

Shimada's recent innovations include several patents that emphasize thermoelectric materials and processing methodologies. One notable patent details a thermoelectric conversion material that consists of a sintered body featuring a main phase with crystal grains made of Ce, Mn, Fe, and Sb, which collectively create a skutterudite structure. Notably, the grain boundary incorporates a sintering aid phase with Mn, Sb, and O. This advancement presents a method to enhance sinterability while preserving a practical dimensionless figure-of-merit, ZT, thereby lowering processing costs effectively.

Additionally, Shimada has developed a plasma processing method aimed at enhancing silicon substrate processing. This method includes a trench formation step through focused plasma generated by pulse-modulated radio frequency power, followed by an oxidation step utilizing only oxygen gas. The repetition of these two steps promotes a more efficient trench isolation process, vital for modern chip manufacturing.

Career Highlights

Throughout his career, Takeshi Shimada has collaborated with prominent firms such as Hitachi Metals, Ltd. and Hitachi High-Technologies Corporation. His extensive experience in these companies has provided him with a robust background in both material science and engineering applications, reinforcing his standing as an expert in thermal management technologies.

Collaborations

Among Shimada's notable collaborators are Kazuya Toji and Kazuhiro Nishikawa. Working alongside talented professionals like them has allowed Shimada to foster innovation and push the boundaries of existing technologies, making significant advancements in thermoelectric applications and plasma processing methods.

Conclusion

Takeshi Shimada's innovative work in thermoelectric conversion materials and plasma processing techniques exemplifies the spirit of invention. With 41 patents to his name, his contributions continue to influence the fields of energy efficiency and semiconductor technology. As he advances his research, Shimada remains a prominent figure in the landscape of modern inventions.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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