The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2015
Filed:
Jan. 21, 2011
Applicants:
Kentaro Yamada, Shunan, JP;
Takeshi Shimada, Hikari, JP;
Takahiro Abe, Kudamatsu, JP;
Inventors:
Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); B44C 1/22 (2006.01); H01L 21/302 (2006.01); H01L 21/461 (2006.01); G11B 5/31 (2006.01); C23F 4/00 (2006.01); H01F 41/34 (2006.01);
U.S. Cl.
CPC ...
G11B 5/3163 (2013.01); C23F 4/00 (2013.01); H01F 41/34 (2013.01);
Abstract
In a plasma processing method of dry-etching of a magnetic film having a thickness of 200 nm to 500 nm, a plasma processing method of dry-etching of a sample having the magnetic film on which a multilayered film including a resist film, an non-organic film underlying the resist film, a Cr film underlying the non-organic film, and an AlOfilm underlying the Cr film.