Saitama, Japan

Takashi Ohshima

USPTO Granted Patents = 53 

Average Co-Inventor Count = 4.1

ph-index = 8

Forward Citations = 320(Granted Patents)

Forward Citations (Not Self Cited) = 305(Dec 10, 2025)


Location History:

  • Fuchu, JP (1993)
  • Akishima, JP (1997 - 1998)
  • Higashimurayama, JP (2005 - 2012)
  • Saitama, JP (2009 - 2018)
  • Tokyo, JP (1991 - 2023)

Company Filing History:


Years Active: 1991-2025

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Areas of Expertise:
Electron Beam Application Device
Electron Gun
Electron Microscope
Charged Particle Detector
Ion Beam Device
Field Emission Electron Source
Scanning Electron Microscope
Gas Field Ion Source
Charged Particle Beam Apparatus
Sample Observation Method
Electron Beam Source
Absorption Current Image Apparatus
53 patents (USPTO):Explore Patents

Title: Takashi Ohshima: Innovator in Electron Beam Technology

Introduction

Takashi Ohshima, a prominent inventor based in Saitama, Japan, holds a remarkable portfolio of 51 patents. His work primarily focuses on advancements in electron beam technology, which has significant implications in various fields, particularly in microscopy. Ohshima's innovative designs enhance the performance and lifespan of electron guns and electron microscopes.

Latest Patents

Among his latest inventions, two notable patents stand out: the Electron Gun and the Electron Microscope. The electron gun features a first and second anode electrode that generates acceleration and deceleration electric fields. It employs a lens electric field that facilitates the irradiation of samples with an electron beam emitted from outside the optical axis of the photoelectric film, allowing for unobstructed performance. This design supports a wide range of off-optical axis electron beams, essential for high-brightness photocathodes operating under high vacuum conditions. As a result, both the photoelectric film and the electron gun benefit from extended lifespan, stabilization, and improved brightness. Furthermore, this innovation aids in controlling the emission of electron beams from various positions on the photoelectric film, enabling precise timing and condition control within electron microscopes.

The second patent, the Electron Gun and Electron Beam Application Apparatus, describes an electron beam emitted from a photoexcited electron gun that is enhanced in luminance. The apparatus includes a photocathode made up of a substrate and photoelectric film, a light source emitting pulsed excitation light, a condenser lens to focus this light, and an extractor electrode that accelerates the generated electron beam by focusing on the pulsed light. This process allows the pulsed excitation light to be concentrated at different timings across various positions on the photoelectric film, which further amplifies the efficacy of the electron gun.

Career Highlights

Throughout his career, Takashi Ohshima has contributed significantly to his field, working with notable companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has allowed him to refine his inventions and push the boundaries of electron beam technology.

Collaborations

Ohashima has collaborated with other talented individuals, including Souichi Katagiri and Mitsugu Sato. These partnerships have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies in electron beam applications.

Conclusion

Takashi Ohshima's contributions to electron beam technology are both impressive and transformative. With a successful career marked by numerous patents and significant collaborations, his innovations continue to influence the fields of microscopy and beyond. His work exemplifies the impact of dedicated inventors in advancing technology for various applications, ensuring that their legacy will endure for generations to come.

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