Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hitachi, Ltd.

Senqcia Corporation

The University of Tokyo

Agency of Industrial Science and Technology

Riken Corporation

Takashi Ohshima

Hideo Morishita

Souichi Katagiri

Mitsugu Sato

Yoichi Ose

Keigo Kasuya

Toshihide Agemura

Sukehiro Ito

Tomihiro Hashizume

Michio Hatano

Hiroyasu Shichi

Toshiaki Kusunoki

Noriaki Arai

Tatsuro Ide

Hiroyuki Shinada

Satoshi Tomimatsu

Yusuke Ominami

Shinichi Matsubara

Junichi Katane

Shin Imamura

Soichi Katagiri

Atsuhiko Kobayashi

Tsukasa Matsuzaki

Yuichi Nakabo

Hideo Todokoro

Yusuke Sakai

Makoto Suzuki

Hajime Kawano

Tohru Ishitani

Katsuhiro Kuroda

Eiichi Murakami

Momoyo Enyama

Masanobu Miyao

Tomonobu Tsuchiya

Kiyokazu Nakagawa

Minami Shouji

Yuusuke Oominami

Tetsuya Sawahata

Naohiro Kohmu

Shigeru Kokubo

Hiroyuki Minemura

Yutaka Kaneko

Hiroyuki Ito

Hiroshi Makino

Takashi Doi

Makoto Ezumi

Yumiko Anzai

Takeshi Kawasaki

Taku Sakazume

Kunio Harada

Masakatsu Shibasaki

Kenko Uchida

Satoru Fukuhara

Tsunenori Nomaguchi

Akio Yoneyama

Hiroshi Toyama

Shahedul Hoque

Makoto Kuwahara

Kiyonori Ohyu

Teruo Kohashi

Sho Takami

Shunsuke Mizutani

Sadamitsu Aso

Yasuko Aoki

Koichiro Takeuchi

Hirokazu Nishida

Takashi Furukawa

Yuta Imai

Yuji Kasai

Soichiro Matsunaga

Akiko Hisada

Masashi Kimura

Takao Matsumoto

Kenichi Hirane

Minoru Kaneda

Yuji Otake

Taiga Okumura

Hirokazu Maesaka

Shin-ichi Matsubara

Tetsuhiro Nemoto

Hiroyuki Eto

Shingo Kimura

Shinpei Hosaka

Yasuko Watanabe

Hiromitsu Seino

Hiroyuki Honda

An activation mechanism is provided in an activation region of an electron gun, and includes a light source deviceconfigured to irradiate a photocathode with excitation light, a heat generating element, an oxygen generation unit configured to generate oxygen by heating the heat generating element, and an emission current meter configured to monitor an emission current generated by electron emission when the photocathodeis irradiated with the excitation light from the light source device. In a surface activation process, the photocathode is irradiated with the excitation light from the light source device, an emission current amount of the photocathode is monitored by the emission current meter, the heat generating element is heated to generate oxygen by the oxygen generation unit, and the heating of the heat generating element is stopped when the emission current amount of the photocathode satisfies a predetermined stop criterion.

Electron beam application device

The apparatus includes: a photocathode including a substrate and a photoelectric film formed on the substrate; a light source configured to emit a pulsed excitation light; a condenser lens facing the substrate of the photocathode and configured to condense the pulsed excitation light toward the photocathode; a first anode electrode and a second anode electrode facing the photoelectric film of the photocathode; a first power supply configured to apply a first control voltage between the first anode electrode and the second anode electrode; and a second power supply configured to apply an acceleration voltage between the photocathode and the second anode electrode. The first anode electrode is disposed between the photocathode and the second anode electrode. A surface of the first anode electrode facing the second anode electrode has a recessed shape, and a surface of the second anode electrode facing the first anode electrode has a protruding shape.

Electron gun and electron beam application device

The electron gun is provided with a first anode electrode and a second anode electrode to generate an acceleration and deceleration electric field. A lens electric field makes it possible to irradiate a sample with an electron beam emitted from a part outside an optical axis of the photoelectric film without being blocked by a differential exhaust diaphragm. A wide range of electron beams off-optical axis can be used even in a high-brightness photocathode that requires high vacuum. As a result, the photoelectric film and the electron gun can be extended in life, can be stabilized, and can be increased in brightness. Further, it is possible to facilitate a control of emitting electron beams from a plurality of positions on the photoelectric film, a timing control of emitting electron beams from a plurality of positions, a condition control of an electron beam in an electron microscope using electron beams.

Electron gun and electron microscope

An electron beam emitted from a photoexcited electron gun is increased in luminance. An electron gunincludes: a photocathodeincluding a substrateand a photoelectric film; a light sourcethat emits pulsed excitation light; a condenser lensthat focuses the pulsed excitation light toward the photocathode; and an extractor electrodethat faces the photocathode and that accelerates an electron beam generated from the photoelectric film by focusing the pulsed excitation light by the condenser lens, transmitting the pulsed excitation light through the substrate of the photocathode, and causing the pulsed excitation light to be incident on the photocathode. The pulsed excitation light is condensed at different timings at different positions on the photoelectric film of the photocathode.

Electron gun and electron beam application apparatus

A scanning electron beam apparatus which two-dimensionally scans a sample by an electron beam to achieve high resolution even with a photoexcited electron source. The electron beam apparatus includes a photocathode including a substrate having a refractive index of more than 1.7 and a photoemissive film, a focusing lens configured to focus an excitation light toward the photocathode, an extractor electrode disposed facing the photocathode and configured to accelerate an electron beam generated from the photoemissive film by focusing the excitation light by the focusing lens and emitting the excitation light through the substrate, and an electron optics including a deflector configured to two-dimensionally scan a sample by the electron beam accelerated by the extractor electrode. For a spherical aberration of the focusing lens, a root mean square of the spherical aberration on the photoemissive film is equal to or less than 1/14 of a wavelength of the excitation light.

Electron beam apparatus

The invention provides an electron source including a columnar chip of a hexaboride single crystal, a metal pipe that holds the columnar chip of the hexaboride single crystal, and a filament connected to the metal pipe at a central portion. The columnar chip of the hexaboride single crystal is formed into a cone shape at a portion closer to a tip than a portion held in the metal pipe, and a tip end portion having the cone shape has a (310) crystal face. Schottky electrons are emitted from the (310) crystal face. According to the invention, it is possible to provide a novel electron source having monochromaticity, long-term stability of an emitter current, and high current density.

Electron source, method for manufacturing the same, and electron beam device using the same

To provide an electron microscope capable of performing the switching-over between normal illumination and annular illumination, wide-area irradiation, an interference pattern as desired or normal illumination in an expeditious and readily manner or achieving a better S/N ratio, the electron microscope comprises a photocathodewith negative electron affinity in use; an excitation optical system to excite the photocathode; and an electron optics system to irradiate an electron beamgenerated from the photocathode by excitation lightirradiated through the excitation optical system onto a sample, the excitation optical system including a light source devicefor the excitation light; and an optical modulation meanswhich is disposed in an optical path of the excitation light to perform spatial phase modulation to the excitation light.

Electron microscope

The objective of the present invention is to provide a charged particle detector and a charged particle beam device with which it is possible to acquire a high luminous output while rapidly eliminating charged particles that are incident to a scintillator. In order to achieve said objective the present invention proposes: a charged particle detector provided with a light-emitting unit including a laminated structure obtained by laminating a GaInN-containing layer and a GaN layer, and provided with a conductive layer that is in contact with the GaInN-containing layer on the charged particle incidence surface side of the laminated structure; and a charged particle beam device.

Charged particle detector including a light-emitting section having lamination structure, charged particle beam device, and mass spectrometer

The disclosure provides a charged particle detector including a scintillator that emits light with stable intensity and obtains high light emission intensity regardless of an energy of an incident electron. The disclosure provides the charged particle detector including: a first light-emitting part () in which a layer containing GaAlInN (where 0&#x2264;x&#x3c;1, 0&#x2264;y&#x3c;1) and a layer containing GaN are alternately laminated; a second light-emitting part () in which the layer containing GaAlInN (where 0&#x2264;x&#x3c;1, 0&#x2264;y&#x3c;1) and the layer containing GaN are alternately laminated; and a non-light-emitting part () that is interposed between the first light-emitting part () and the second light-emitting part () (see FIG.).

Charged particle detector and charged particle beam apparatus

An electron source that can be used stably for a long time even when hexaboride is used, and an electron beam device using the electron source are provided. The invention is directed to an electron source which includes a filament made of a metal, a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery, and a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is in contact with a bottom of each of the plurality of recesses of the metal tube.

Electron source and electron beam device using the same

In order to provide a stable hexaboride single-crystal field emission electron source capable of heat-flashing, this field emission electron source is provided with a metal filament, a metal tube joined thereto, a hexaboride tip that emits electrons, and graphite sheets that are independent of the metal tube and the hexaboride tip. The hexaboride tip is arranged so as not to be in structural contact with the metal tube due to the graphite sheets. The hexaboride tip, the graphite sheets, and the metal tube are configured so as to be mechanically and electrically in contact with one another.

Field emission electron source, method for manufacturing same, and electron beam device

An electron beam apparatus which can stably achieve high spatial resolution also during low acceleration observation using CeBfor the CFE electron source is provided. In an electron beam apparatus having a CFE electron source, the emitter of the electron beam of the CFE electron source is Ce hexaboride or a hexaboride of a lanthanoid metal heavier than Ce, the hexaboride emits the electron beam from the {310} plane, and the number of the atoms of the lanthanoid metal on the {310} plane is larger than the number of boron molecules comprising six boron atoms on the {310} plane.

Since a diffraction phenomenon occurs in the electron beam passing through a differential evacuation hole, an electron beam whose probe diameter is narrowed cannot pass through a hole having an aspect ratio of a predetermined value or more, and accordingly, a degree in vacuum on the electron beam side cannot be improved. By providing a differential evacuation hole with a high aspect ratio in an ion beam device, it becomes possible to obtain an observed image on a sample surface, with the sample being placed under the atmospheric pressure or a pressure similar thereto, in a state where the degree of vacuum on the ion beam side is stabilized. Moreover, by processing the differential evacuation hole by using an ion beam each time it is applied, both a normal image observation with high resolution and an image observation under atmospheric pressure or a pressure similar thereto can be carried out.

Ion beam device and sample observation method

The purpose of the present invention is to eliminate the effort in placement and extraction of samples in observations using transmitted charged particles. A charged particle beam device () is characterized by having: a charged particle optical lens tube that irradiates a sample () with a primary charged particle beam; a sample stage on which a light emitting member () that emits light because of charged particles that have come by transmission internally in the sample () or scattering therefrom or a sample platform () having the light emitting member () is attachably and detachably disposed; and a detector () that detects the light emitted by the light emitting member.

Charged particle beam device, sample observation method, sample platform, observation system, and light emitting member

Provided is a charged particle beam device including a charged particle optical column that irradiates a specimen with a primary charged particle beam, and a specimen base rotating unit that is capable of rotating the specimen base in a state of an angle formed by a surface of the specimen base and an optical axis of the primary charged particle beam being inclined to a non-perpendicular angle, in which the specimen base is configured to include a detecting element that detects a charged particle scattered or transmitted inside the specimen, and transmitted charged particle images of the specimen corresponding to each angle is acquired by irradiating the specimen in a state of the specimen base rotating unit being rotated at a plurality of different angles.

Charged particle beam device

Growing community of inventors

Saitama, Japan

Takashi Ohshima