Kumamoto, Japan

Takao Inada

USPTO Granted Patents = 14 

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Hsin-chu, TW (2015)
  • Tosu, JP (2015)
  • Koshi, JP (2020 - 2023)
  • Kumamoto, JP (2020 - 2024)

Company Filing History:


Years Active: 2015-2024

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14 patents (USPTO):

Title: The Innovative Contributions of Takao Inada

Introduction

Takao Inada is a prominent inventor based in Kumamoto, Japan, known for his significant contributions to substrate processing technology. With a total of 14 patents to his name, Inada has made remarkable advancements in the field, particularly through his work at Tokyo Electron Limited.

Latest Patents

Inada's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing method involves generating a mixture liquid by mixing a phosphoric acid aqueous solution with an additive that suppresses the precipitation of silicon oxide. This mixture is circulated through a path that includes a back pressure valve, allowing for efficient processing. The substrate processing apparatus features a processing bath, a mixing device, a liquid path, and a silicon solution supply, all designed to enhance the substrate processing experience.

Career Highlights

Throughout his career, Takao Inada has focused on developing innovative solutions that improve substrate processing efficiency. His work has been instrumental in advancing the technology used in various applications, making him a key figure in the industry.

Collaborations

Inada has collaborated with notable colleagues such as Hisashi Kawano and Toshiyuki Shiokawa, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Takao Inada's contributions to substrate processing technology have established him as a leading inventor in his field. His patents and collaborative efforts continue to influence advancements in the industry, showcasing the importance of innovation in technology.

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