Location History:
- Owariasahi, JP (1993 - 1994)
- Owariasahi-shi, Aichi-ken, JP (1998)
- Aichi-gun, JP (2007)
- Aichi-ken, JP (1999 - 2010)
- Nagoya, JP (2011 - 2015)
- Nagakute, JP (2015 - 2019)
- Aichi, JP (2003 - 2021)
Company Filing History:
10 out of 3,081 
3 out of 1,139 
3 out of 36,713 
Years Active: 1993-2021
Title: The Innovations of Takahiro Kozawa
Introduction
Takahiro Kozawa is a prominent inventor based in Aichi, Japan, known for his significant contributions to the field of technology and engineering. With a total of 16 patents to his name, he has made remarkable advancements in various applications, particularly in the manufacturing of semiconductor materials.
Latest Patents
Kozawa's latest patents include a film forming apparatus designed to enhance the efficiency of gas supply in manufacturing processes. This apparatus features a unique supply part with multiple partitions and flow paths that allow for the introduction of different gases. Additionally, he has developed a method for manufacturing silicon carbide (SiC) epitaxial wafers by utilizing both nitrogen-based and chlorine-based gases. This innovative approach involves mixing these gases at elevated temperatures to facilitate the growth of high-quality SiC layers.
Career Highlights
Throughout his career, Takahiro Kozawa has worked with notable companies such as Toyoda Gosei Co., Ltd. and Toyota Central R&D Labs, Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge research and development projects.
Collaborations
Kozawa has collaborated with esteemed colleagues, including Naoki Shibata and Junichi Umezaki, to further advance his research and innovations in the field.
Conclusion
Takahiro Kozawa's work exemplifies the spirit of innovation and dedication to technological advancement. His patents and contributions continue to influence the industry and pave the way for future developments in semiconductor manufacturing.