The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2015
Filed:
Aug. 31, 2011
Takahiro Kozawa, Nagoya, JP;
Kenji Nakashima, Nisshin, JP;
Keeyoung Jun, Nisshin, JP;
Takahiro Ito, Toyota, JP;
Takahiro Kozawa, Nagoya, JP;
Kenji Nakashima, Nisshin, JP;
Keeyoung Jun, Nisshin, JP;
Takahiro Ito, Toyota, JP;
Toyota Jidosha Kabushiki Kaisha, Aichi-ken, JP;
Abstract
A vapor deposition device includes a vapor deposition chamber, a heating chamber, a mixing chamber, a first reservoir for storing trichlorosilane gas, and a second reservoir for storing silane gas that reacts with hydrochloric acid gas. The heating chamber communicates with the first reservoir and the mixing chamber, heats the trichlorosilane gas and then supplies the heated gas to the mixing chamber. The mixing chamber communicates with the second reservoir and the vapor deposition chamber, mixes the heated gas supplied from the heating chamber and the silane gas and then supplies the mixed gas to the vapor deposition chamber. A temperature in the heating chamber is higher than a temperature in the mixing chamber.