Location History:
- Nagoya, JP (2014)
- Nisshin, JP (2015)
Company Filing History:
Years Active: 2014-2015
Title: Keeyoung Jun: Innovator in Vapor Deposition Technology
Introduction
Keeyoung Jun is a notable inventor based in Nisshin, Japan. He has made significant contributions to the field of vapor deposition technology, holding 2 patents that showcase his innovative approach to semiconductor manufacturing.
Latest Patents
One of his latest patents is a vapor deposition device and vapor deposition method. This device includes a vapor deposition chamber, a heating chamber, a mixing chamber, a first reservoir for storing trichlorosilane gas, and a second reservoir for storing silane gas that reacts with hydrochloric acid gas. The heating chamber communicates with the first reservoir and the mixing chamber, heating the trichlorosilane gas before supplying it to the mixing chamber. The mixing chamber then combines the heated gas with silane gas and supplies the mixed gas to the vapor deposition chamber. Notably, the temperature in the heating chamber is higher than that in the mixing chamber.
Another significant patent is a vapor-phase growth method for semiconductor film. This process involves supplying a mixed material gas, which includes a chlorosilane gas and a carrier gas, to a substrate heated at temperatures ranging from 1200 to 1400°C. The supply rate of the chlorosilane gas is equal to or more than 200 μmol per minute per 1 cm of the substrate's surface. The carrier gas consists of hydrogen and at least one or more gases selected from argon, xenon, krypton, and neon.
Career Highlights
Keeyoung Jun is currently employed at Toyota Jidosha Kabushiki Kaisha, where he continues to develop innovative technologies in the automotive and semiconductor industries. His work has contributed to advancements in manufacturing processes that enhance the efficiency and effectiveness of vapor deposition techniques.
Collaborations
Throughout his career, Keeyoung has collaborated with talented individuals such as Takahiro Ito and Takahiro Kozawa. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Keeyoung Jun is a prominent figure in the field of vapor deposition technology, with a focus on improving semiconductor manufacturing processes. His patents reflect his commitment to innovation and excellence in his field.