Tokyo, Japan

Takahiro Hiramatsu

This inventor holds 26 USPTO granted patents and 15 published patent applications and 10 EPO patents, primarily in Ultrasonic Atomization. Top assignees: Toshiba Mitsubishi-Electric Industrial Systems Corporation, Ricoh Company, Ltd., Tmeic Corporation. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takahiro Hiramatsu. Retrieved from https://idiyas.com/inventor/takahiro-hiramatsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 69.2

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 34(Granted Patents)


Location History:

  • Kanagawa, JP (2015 - 2018)
  • Tokyo, JP (2010 - 2023)

Company Filing History:


Years Active: 2010-2026

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Areas of Expertise:
Ultrasonic Atomizing Device
Mist Flow Rate Measuring
Film Forming Apparatus
Metal Oxide Film
Solar Cell Manufacturing
Imaging Device
Optical Engine
Image Projection
Communication Apparatus
Data Distribution
Electronic Device
Illumination Optical System
26 patents (USPTO):Explore Patents

Title: Innovations of Takahiro Hiramatsu: Pioneering Patents from Tokyo

Introduction: Takahiro Hiramatsu is an innovative inventor based in Tokyo, Japan, known for his significant contributions to the field of film formation and metal oxide technologies. With a remarkable portfolio of 11 patents, Hiramatsu exemplifies the spirit of innovation and technical advancement in his industry.

Latest Patents: Among Hiramatsu's latest patents are two notable inventions: the Film Forming Apparatus and a Metal Oxide Film Formation Method. The Film Forming Apparatus features an intricate process involving multiple conveyors to manage the substrate and the directed spraying of source mist through thin film forming nozzles. This innovative approach ensures high-quality film deposition by meticulously controlling temperature and material application. The Metal Oxide Film Formation Method details a sophisticated sequence where a raw-material solution, rich in aluminum, is converted to a mist and combined with a reaction aiding solution to facilitate aluminum oxide formation. This mixed mist is then applied to a heated P-type silicon substrate, showcasing Hiramatsu's expertise in semiconductor processing.

Career Highlights: Hiramatsu has had an impactful career, working with prominent organizations such as Toshiba Mitsubishi Electric Industrial Systems Corporation and Kochi Prefectural Public University Corporation. His experience in these influential companies has greatly contributed to his development as a leading inventor in his field.

Collaborations: Throughout his career, Hiramatsu has collaborated with talented individuals, including Hiroyuki Orita and Takahiro Shirahata. These collaborations have fostered innovation and created new pathways for advancements in technology.

Conclusion: Takahiro Hiramatsu stands as a prominent figure in the realm of inventions, with a strong emphasis on film technology and metal oxide applications. His dedication to innovation is evident through his extensive patents and collaborations, marking him as a valuable contributor to the technological advancements originating from Tokyo.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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