The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2019
Filed:
Mar. 28, 2012
Applicants:
Takahiro Shirahata, Tokyo, JP;
Hiroyuki Orita, Tokyo, JP;
Takahiro Hiramatsu, Tokyo, JP;
Inventors:
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
H01B 1/08 (2006.01); C23C 18/12 (2006.01); H01L 31/18 (2006.01); C23C 18/14 (2006.01);
U.S. Cl.
CPC ...
C23C 18/1216 (2013.01); C23C 18/1258 (2013.01); C23C 18/1291 (2013.01); C23C 18/1295 (2013.01); C23C 18/14 (2013.01); H01B 1/08 (2013.01); H01L 31/1884 (2013.01); Y02E 10/50 (2013.01);
Abstract
In a method for producing a metal oxide film according to the present invention, a solution containing zinc is sprayed onto a substrate placed under non-vacuum, and then, a dopant solution containing a dopant is sprayed onto the substrate. After that, a deposited metal oxide film is subjected to a resistance reducing treatment. A molar concentration of the dopant supplied to the substrate with respect to a molar concentration of the zinc supplied to the substrate is not less than a predetermined value.