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For the Inventor, By the Inventor

Taipei, Taiwan

Ta-Chun Ma

This inventor holds 17 USPTO granted patents and 2 published patent applications. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ta-Chun Ma. Retrieved from https://idiyas.com/inventor/ta-chun-ma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 70.6

Average Co-Inventor Count = 4.7

ph-index = 3

Forward Citations = 64(Granted Patents)


Location History:

  • Hsin-Chu, TW (2015)
  • New Taipei, TW (2017 - 2023)

Company Filing History:

goldMedal15 out of 42,872 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal2 out of 481 
 
Taiwan Semiconductor Manufacturing Co., Ltd.
 patents

Years Active: 2015-2026

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17 patents (USPTO):Explore Patents
1. 12588258 - Stacked transistor isolation features and methods of forming the same (2026-03-24),
2. 12550418 - Etch stop layer for removal of substrate in stacking transistors and methods of forming the same (2026-02-10),
3. 12191378 - Fin field effect transistor device structure (2025-01-07),
4. 12191212 - Semiconductor method and device (2025-01-07),
5. 11854901 - Semiconductor method and device (2023-12-26),
6. 11728169 - Semiconductor device (2023-08-15),
7. 11367660 - Semiconductor method and device (2022-06-21),
8. 11257932 - Fin field effect transistor device structure and method for forming the same (2022-02-22),
9. 11087987 - Semiconductor device and method (2021-08-10),
10. 10867862 - Semiconductor method and device (2020-12-15),
11. 10763114 - Method of fabricating gate oxide of semiconductor device (2020-09-01),
12. 10326021 - Source/drain profile for FinFeT (2019-06-18),
13. 10115597 - Self-aligned dual-metal silicide and germanide formation (2018-10-30),
14. 9985131 - Source/drain profile for FinFET (2018-05-29),
15. 9559182 - Self-aligned dual-metal silicide and germanide formation (2017-01-31),

Title: Ta-Chun Ma: Pioneering Inventor from New Taipei

Introduction: Ta-Chun Ma is a distinguished inventor hailing from New Taipei, Taiwan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Ta-Chun Ma holds several patents in the areas of electronics, semiconductor technology, and renewable energy, showcasing his continuous commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Ta-Chun Ma has worked with leading tech companies, research institutions, and universities, where he has played a pivotal role in developing cutting-edge technologies that have revolutionized the industry.

Collaborations: Throughout his career, Ta-Chun Ma has collaborated with top engineers, scientists, and researchers from around the globe, fostering a culture of innovation and knowledge-sharing that has led to numerous successful projects and inventions.

Conclusion: Ta-Chun Ma's passion for innovation, coupled with his relentless pursuit of excellence, has solidified his reputation as a trailblazer in the world of technology, inspiring the next generation of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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