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For the Inventor, By the Inventor

Yongin-si, South Korea

Suk-Joo Lee

USPTO Granted Patents = 15 

Average Co-Inventor Count = 4.5

ph-index = 5

Forward Citations = 63(Granted Patents)


Company Filing History:

goldMedal14 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal1 out of 4 
 
Neolab Convergence Inc.
 patents

Years Active: 2003-2018

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15 patents (USPTO):Explore Patents
1. 9941172 - Method for fabricating semiconductor device including a via hole in a mask pattern (2018-04-10),
2. 9570364 - Method of detecting focus shift in lithography process, method of analyzing error of transferred pattern using the same and method of manufacturing semiconductor device using the methods (2017-02-14),
3. 9557637 - Method of designing patterns of semiconductor devices in consideration of pattern density (2017-01-31),
4. 9470972 - Mask for photolithography, method for fabricating the same and method for manufacturing semiconductor device using the mask (2016-10-18),
5. 9111185 - Method and apparatus to manage contents in network and web server used thereto (2015-08-18),
6. 8952423 - Semiconductor device having decoupling capacitors and dummy transistors (2015-02-10),
7. 8338310 - Method of forming line/space patterns (2012-12-25),
8. 8026044 - Method of forming fine patterns of semiconductor device (2011-09-27),
9. 7940373 - Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same (2011-05-10),
10. 7892982 - Method for forming fine patterns of a semiconductor device using a double patterning process (2011-02-22),
11. 7842450 - Method of forming a semiconductor device (2010-11-30),
12. 7807318 - Reflective photomask and method of fabricating the same (2010-10-05),
13. 7787301 - Flash memory device using double patterning technology and method of manufacturing the same (2010-08-31),
14. 7452825 - Method of forming a mask structure and method of forming a minute pattern using the same (2008-11-18),
15. 6571384 - Method of forming fine patterns on semiconductor device (2003-05-27),

Title: The Innovative Contributions of Suk-Joo Lee

Introduction

Suk-Joo Lee is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His work has been instrumental in advancing the methods used in semiconductor fabrication and lithography processes.

Latest Patents

Among his latest patents, Suk-Joo Lee has developed a method for fabricating semiconductor devices that includes a via hole in a mask pattern. This innovative method involves forming an interlayer insulating layer with distinct regions and creating an etch stop pattern to expose specific areas. Additionally, he has patented a method for detecting focus shift in lithography processes, which includes generating contour bands of mask patterns to analyze focus shifts effectively. These advancements are crucial for improving the accuracy and efficiency of semiconductor manufacturing.

Career Highlights

Suk-Joo Lee has worked with leading companies in the technology sector, including Samsung Electronics Co., Ltd. and Neolab Convergence Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Throughout his career, Suk-Joo Lee has collaborated with notable colleagues, including Han-Ku Cho and Doo-youl Lee. These partnerships have fostered a creative environment that has led to the development of advanced technologies in the semiconductor field.

Conclusion

Suk-Joo Lee's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor manufacturing and technology advancements.

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