The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Oct. 26, 2007
Sung-soo Suh, Yongin-si, KR;
Suk-joo Lee, Yongin-si, KR;
Han-ku Cho, Seongnam-si, KR;
Yong-jin Chun, Daejeon, KR;
Sung-woo Lee, Suwon-si, KR;
Young-chang Kim, Seoul, KR;
Sung-soo Suh, Yongin-si, KR;
Suk-joo Lee, Yongin-si, KR;
Han-ku Cho, Seongnam-si, KR;
Yong-jin Chun, Daejeon, KR;
Sung-woo Lee, Suwon-si, KR;
Young-chang Kim, Seoul, KR;
Abstract
Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.