Yong-Jin Chun

Title: Yong-Jin Chun: Innovator in Lithography Metrology

Introduction

Yong-Jin Chun is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of lithography metrology, particularly in semiconductor manufacturing. With a total of 4 patents to his name, Chun's work has advanced the precision and efficiency of lithography processes.

Latest Patents

Chun's latest patents include a lithography metrology method for determining the best focus and best dose. This innovative method involves acquiring focus sensitivity data and dose sensitivity data of sample patterns on a substrate. By selecting focus patterns based on sensitivity, Chun's method allows for the determination of optimal focus and dose conditions. Another notable patent is a method for detecting focus shift in the lithography process. This method generates contour bands of a mask pattern to analyze focus shifts, enhancing the accuracy of semiconductor device manufacturing.

Career Highlights

Yong-Jin Chun is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of lithography technology. His expertise in metrology has positioned him as a key player in the semiconductor industry. Chun's innovative approaches have not only improved manufacturing processes but have also contributed to the overall advancement of semiconductor technology.

Collaborations

Chun has collaborated with notable colleagues, including Byoung-Il Choi and Suk-Joo Lee. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.

Conclusion

Yong-Jin Chun's contributions to lithography metrology exemplify the impact of innovation in semiconductor manufacturing. His patents reflect a commitment to enhancing precision and efficiency in the industry. Through his work at Samsung Electronics Co., Ltd., Chun continues to shape the future of semiconductor technology.