The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Jan. 23, 2007
Applicants:
Jin-hong Park, Seoul, KR;
Han-ku Cho, Seongnam-si, KR;
Seong-sue Kim, Seoul, KR;
Sang-gyun Woo, Yongin-si, KR;
Suk-joo Lee, Yongin-si, KR;
Inventors:
Jin-Hong Park, Seoul, KR;
Han-Ku Cho, Seongnam-si, KR;
Seong-Sue Kim, Seoul, KR;
Sang-Gyun Woo, Yongin-si, KR;
Suk-Joo Lee, Yongin-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A reflective photomask for EUV light is disclosed. The reflective photomask may include a projecting pattern selectively formed on a substrate and a reflective layer on the substrate and the projecting pattern.