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For the Inventor, By the Inventor

Seoul, South Korea

Seong-sue Kim

This inventor holds 40 USPTO granted patents and 4 published patent applications and 1 EPO patent, primarily in Extreme Ultraviolet Lithography. Top assignees: Samsung Electronics Co., Ltd., Fine Semitech Corp.. Active years: 2001-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seong-sue Kim. Retrieved from https://idiyas.com/inventor/seong-sue-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 40 

% Patents Active = 77.5


Average Co-Inventor Count = 3.4

ph-index = 3

Forward Citations = 62(Granted Patents)


Location History:

  • Hwaseong-si, KR (2010 - 2012)
  • Seoul, KR (2001 - 2017)

Company Filing History:

goldMedal40 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal1 out of 7 
 
Fine Semitech Corp.
 patents
where one patent can have more than one assignee

Years Active: 2001-2017

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Areas of Expertise:
Reflective Masks
Extreme Ultraviolet Lithography
Photomask
Integrated Circuit
EUV Projection Lens
Optical Recording Medium
Registration Error
Beam Generator
Aerial Image Measurement
Phase Shift Mask
Optic System
Overwrite Characteristics
40 patents (USPTO):Explore Patents
1. 9645484 - Reflective masks for use in extreme ultraviolet lithography apparatus and methods of manufacturing the same (2017-05-09),
2. 9588413 - Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device (2017-03-07),
3. 9465286 - Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device (2016-10-11),
4. 9239516 - Method of manufacturing reflective extreme ultraviolet mask (2016-01-19),
5. 9176375 - Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit (2015-11-03),
6. 9170480 - Reflective extreme ultraviolet mask and method of forming a pattern using the same (2015-10-27),
7. 9025624 - Beam generator (2015-05-05),
8. 8968969 - Reflective extreme ultraviolet mask and method of manufacturing the same (2015-03-03),
9. 8779403 - Apparatus and method for generating extreme ultra violet radiation (2014-07-15),
10. 8637840 - EUV projection lens and optic system having the same (2014-01-28),
11. 8470500 - Reflective extreme ultraviolet mask (2013-06-25),
12. 8422760 - System for monitoring haze of a photomask (2013-04-16),
13. 8416665 - Method of and apparatus for recording data on optical recording medium (2013-04-09),
14. 8335039 - Method of measuring aerial image of EUV mask (2012-12-18),
15. 8335038 - Apparatus for measuring aerial image of EUV mask (2012-12-18),

Title: The Innovative Journey of Seong-sue Kim

Introduction: Seong-sue Kim, a pioneering inventor hailing from Seoul, South Korea, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Seong-sue Kim's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable health monitoring devices, and sustainable energy solutions.

Career Highlights: With over two decades of experience in the tech industry, Seong-sue Kim has held key roles in leading research institutions and tech companies, driving forward cutting-edge projects and securing numerous patents along the way.

Collaborations: Throughout his career, Seong-sue Kim has collaborated with top engineers, scientists, and researchers from around the globe, fostering a culture of innovation and excellence in all his projects.

Conclusion: Seong-sue Kim's relentless pursuit of innovation and his passion for pushing the boundaries of technology continue to inspire the next generation of inventors and pave the way for a brighter, more technologically advanced future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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