The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2015
Filed:
Feb. 10, 2014
Sang-hyun Kim, Hwaseong-si, KR;
Seong-sue Kim, Seoul, KR;
Dong-gun Lee, Hwaseong-si, KR;
Chalykh Roman, Suwon-si, KR;
Mun-ja Kim, Suwon-si, KR;
Sang-hyun Kim, Hwaseong-si, KR;
Seong-sue Kim, Seoul, KR;
Dong-gun Lee, Hwaseong-si, KR;
Chalykh Roman, Suwon-si, KR;
Mun-ja Kim, Suwon-si, KR;
Abstract
Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.