Daegu, South Korea

Su Jin Lee

This inventor holds 22 USPTO granted patents and 11 published patent applications and 2 EPO patents, primarily in Photoresist Technology. Top assignees: Youngchang Chemical Co., Ltd., Daegu Gyeongbuk Institute of Science and Technology, Skc Co., Ltd.. Active years: 2016-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Su Jin Lee. Retrieved from https://idiyas.com/inventor/su-jin-lee-upbr5w21

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2016-2025

Loading Chart...
Loading Chart...
Areas of Expertise:
Photoresist Composition
Lithography Process
Semiconductor Manufacturing
EUV Lithography
Etching Method
Pattern Forming
Spin-On Carbon
Micropattern Development
Negative Tone Photoresist
Pattern Profile Improvement
CMP Slurry Composition
22 patents (USPTO):Explore Patents

Title: A Glimpse into the Innovations of Su Jin Lee

Introduction

Su Jin Lee, based in Daegu, South Korea, is a distinguished inventor with an impressive portfolio of 21 patents. His work primarily focuses on advancements in semiconductor technology, where he has made significant contributions that push the boundaries of existing processes.

Latest Patents

Among his latest innovations is the "Highly thick spin-on-carbon hard mask composition and patterning method using same." This groundbreaking patent proposes a novel composition for a thick hard mask ideally suited for use in semiconductor lithography processes. Specifically, it pertains to a spin-on carbon hard mask and a method of applying it to an etching target layer via spin coating and subsequent baking. The composition's high solubility characteristics facilitate the creation of a thick hard mask exhibiting remarkable etching resistance, allowing it to withstand multiple etching processes while maintaining excellent mechanical properties.

Another significant patent from Su Jin Lee is the "Etching pattern forming method in semiconductor manufacturing process." This method innovatively employs a double-layer structure composed of a photoresist film and a multifunctional organic-inorganic mask film, as opposed to the conventional four-layer structure. His approach streamlines the etching process while achieving the same desired etching patterns, thus enhancing efficiency in semiconductor manufacturing.

Career Highlights

Su Jin Lee has collaborated with key industry players, including Youngchang Chemical Co., Ltd. and the Daegu Gyeongbuk Institute of Science and Technology. His experience with these respected organizations has further solidified his position as a leading innovator in the field of semiconductor technologies.

Collaborations

Throughout his journey, Su Jin Lee has worked alongside talented colleagues such as Seung Hyun Lee and Seung Hun Lee. These collaborations have likely contributed to the depth and diversity of his innovative work, fostering a collaborative environment that encourages the exchange of ideas and expertise.

Conclusion

Su Jin Lee's contributions to the field of semiconductor manufacturing through his innovative patents exemplify his dedication to advancing technology. With a strong foundation bolstered by his experiences and collaborations, he continues to pave the way for future innovations in the industry. His work is a testament to the impact of creativity and technical expertise in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…