The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Apr. 26, 2017
Applicant:
Young Chang Chemical Co., Ltd, Gyeongsangbuk-do, KR;
Inventors:
Seung Hun Lee, Daegu, KR;
Seung Hyun Lee, Daegu, KR;
Su Jin Lee, Daegu, KR;
Young Cheol Choi, Gumi-si, KR;
Assignee:
YOUNG CHANG CHEMICAL CO., LTD, Seongju-Gun Gyeongsangbuk-do, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/004 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); G03F 7/0048 (2013.01);
Abstract
The present invention relates to a chemically-amplified-type negative photoresist composition, and more particularly to a chemically-amplified-type negative photoresist composition suitable for use in a semiconductor process, which includes a specific organic acid additive, thereby improving a processing margin in a short-wavelength exposure light source compared to conventional negative photoresists.