The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2024
Filed:
Mar. 25, 2020
Applicant:
Young Chang Chemical Co., Ltd, Gyeongsangbuk-do, KR;
Inventors:
Assignee:
YOUNG CHANG CHEMICAL CO., LTD, Gyeongsangbuk-Do, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C09D 165/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C09D 165/00 (2013.01);
Abstract
Proposed is a composition for a thick hard mask suitable for use in a semiconductor lithography process, and particularly a spin-on carbon hard mask composition and a patterning method of forming a hard mask layer by applying the composition on an etching target layer through spin coating and baking the composition. The composition has high solubility characteristics, thereby enabling the formation of a thick hard mask which can exhibit high etching resistance to tolerate multiple etching processes and excellent mechanical properties.