The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2024
Filed:
Jul. 05, 2019
Applicant:
Young Chang Chemical Co., Ltd, Gyeongsangbukdo, KR;
Inventors:
Assignee:
YOUNG CHANG CHEMICAL CO., LTD, Gyeongsangbuk-do, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); G03F 7/0042 (2013.01); G03F 7/0048 (2013.01); G03F 7/2004 (2013.01);
Abstract
Proposed are an organic-inorganic hybrid photoresist processing solution composition for use in a thin film formation process, a development process, and a stripping process of an organic-inorganic hybrid photoresist, and a processing method using the same. The processing solution composition includes a compound of Chemical Formula 1 and a ketone, an ester, an ether, an additive or a mixture thereof, and is superior in processing of organic materials and ability to adsorb inorganic materials, thereby minimizing the remaining inorganic material content, ultimately preventing processing defects from occurring.