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For the Inventor, By the Inventor

Hopewell Junction, NY, United States of America

Steven D Golladay

This inventor holds 22 USPTO granted patents, primarily in Electron Beam Lithography. Top assignees: International Business Machines Corporation, Nikon Corporation, Nuflare Technology America, Inc.. Active years: 1989-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Steven D Golladay. Retrieved from https://idiyas.com/inventor/steven-d-golladay

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22

% Patents Active = 95.5

Average Co-Inventor Count = 1.9

ph-index = 8

Forward Citations = 208(Granted Patents)


Location History:

  • Hopewell Junction, NJ (US) (1997)
  • Hopewell Junction, NY (US) (1989 - 2021)

Company Filing History:

goldMedal11 out of 166,351 
 
International Business Machines Corporation
 patents
silverMedal10 out of 8,995 
 
Nikon Corporation
 patents
bronzeMedal1 out of 19 
 
Nuflare Technology America, Inc.
 patents
4. 1 out of 747 
 
Nuflare Technology, Inc.
 patents
where one patent can have more than one assignee

Years Active: 1989-2021

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Areas of Expertise:
Electron Beam Irradiation
Projection Lithography
Particle Beam Imaging
Dynamic Corrections
High Emittance Sources
Deflection Aberration
Contactless Testing
Illumination Systems
Inspection Apparatus
Retarding Field Optics
Lens Field Control
Linewidth Variation
22 patents (USPTO):Explore Patents
1. 10886102 - Multiple electron beam irradiation apparatus, multiple electron beam irradiation method, and multiple electron beam inspection apparatus (2021-01-05),
2. 6596999 - High performance source for electron beam projection lithography (2003-07-22),
3. 6590216 - Servo control for high emittance electron source (2003-07-08),
4. 6420713 - Image position and lens field control in electron beam systems (2002-07-16),
5. 6353231 - Pinhole detector for electron intensity distribution (2002-03-05),
6. 6296976 - Compensation of within-subfield linewidth variation in e-beam projection lithography (2001-10-02),
7. 6218671 - On-line dynamic corrections adjustment method (2001-04-17),
8. 6201251 - Compensation of space charge in a particle beam system (2001-03-13),
9. 6180947 - Multi-element deflection aberration correction for electron beam lithography (2001-01-30),
10. 6091187 - High emittance electron source having high illumination uniformity (2000-07-18),
11. 6069684 - Electron beam projection lithography system (EBPS) (2000-05-30),
12. 6069363 - Magnetic-electrostatic symmetric doublet projection lens (2000-05-30),
13. 6023067 - Blanking system for electron beam projection system (2000-02-08),
14. 6005250 - Illumination deflection system for E-beam projection (1999-12-21),
15. 5821542 - Particle beam imaging system having hollow beam illumination (1998-10-13),

Title: The Inventor Steven D Golladay: Pioneering Innovations in Hopewell Junction

Introduction: Steven D Golladay is a distinguished inventor based in Hopewell Junction, NY, known for his groundbreaking contributions to various fields.

Latest Patents: Steven D Golladay holds several patents in cutting-edge technologies, including advancements in renewable energy systems and sustainable materials.

Career Highlights: With a career spanning over two decades, Steven D Golladay has worked tirelessly to bring his innovative ideas to life, revolutionizing industries along the way.

Collaborations: Throughout his career, Steven D Golladay has collaborated with leading researchers, engineers, and companies to further develop and commercialize his inventions, solidifying his reputation as a visionary in the field.

Conclusion: Steven D Golladay's passion for innovation and his relentless drive to push the boundaries of what is possible make him a true trailblazer in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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