The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2002
Filed:
Apr. 28, 1999
Werner Stickel, Ridgefield, CT (US);
Steven Douglas Golladay, Hopewell Junction, NY (US);
Nikon Corporation, Tokyo, JP;
Abstract
A charged particle beam system with a source of charged particles produces a beam directed along a path. A given electromagnetic lens is located along the path. The given electromagnetic lens is adapted to produce a first field directed with a first orientation adapted for affecting a beam of charged particles directed along the path through the lens. A bucking electromagnetic lens is juxtaposed with the given electromagnetic lens adapted to produce a bucking field directed with a bucking orientation adapted for affecting the beam of charged particles directed along the path. The bucking field has an orientation opposing the first field. A fringe field from the bucking electromagnetic lens produces a nulling field to compensate for aberrations and/or beam disturbances.