Werner Stickel

Title: Innovating Charged Particle Beam Systems: The Contributions of Werner Stickel

Introduction: Werner Stickel is a prominent inventor based in Ridgefield, CT, with an impressive portfolio of 23 patents. His significant contributions primarily focus on advanced technologies related to charged particle beam systems, which have profound implications in fields such as electron beam projection lithography and optics.

Latest Patents: Among Stickel’s latest patents is the "Optimized Curvilinear Variable Axis Lens Doublet for Charged Particle Beam Projection System." This innovative patent outlines a sophisticated method for designing optimized charged particle beam projection systems by specifying lens configurations and first-order optics. It involves detailed calculations for lens excitations, alongside configurations of lens systems that provide lens field distributions, beam landing angles, and imaging ray/axis cross-overs. The patent also encompasses a thorough methodology for solving linear equations to derive a curvilinear axis along with associated deflection field distributions. Notably, it calculates a set of up to 54 third-order aberration coefficients along with dynamic correctors meant to eliminate quadratic aberrations. This comprehensive approach allows for an effective assessment and refinement of axial locations in deflector configurations, significantly enhancing system performance.

Another notable patent is the "High Performance Source for Electron Beam Projection Lithography." This invention addresses the challenges posed by magnetic fields that disturb charged particle trajectories within beam systems. Stickel’s work proposes solutions for suppressing these magnetic fields, including relocating charged particle emitters away from field sources and using bucking fields to counterbalance disturbances. It also details the implementation of suitable elements like stigmators in the beam path to manage residual field asymmetries, thereby optimizing overall system functionality.

Career Highlights: Throughout his career, Werner Stickel has held significant positions in some of the most renowned technology companies. He has notably worked with IBM and Nikon Corporation, where he contributed to the advancement of technologies that intersect with his innovative research in charged particle beams and optics.

Collaborations: Stickel has collaborated with esteemed colleagues, including Hans C. Pfeiffer and Steven D. Golladay. Their joint efforts have further pushed the boundaries of research and innovation in their respective fields, allowing for significant advancements in the efficiency and capability of charged particle beam systems.

Conclusion: Werner Stickel's remarkable journey as an inventor has led to significant advancements in the realm of charged particle beam systems. His innovative patents and collaborations have not only enhanced the performance of existing technologies but also paved the way for future developments in this crucial area of research and application. With a solid foundation in both theoretical and practical applications, Stickel continues to be an influential figure in the world of innovations and high-precision optical systems.