logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6483117 B1

PDFFull Text
Date of Patent:
Nov. 19, 2002

Filed:

Jun. 16, 1999

Symmetric blanking for high stability in electron beam exposure systems

Applicant:
Inventors:

Clay S. Clement, Rock Tavern, NY (US);

Michael S. Gordon, Lincolndale, NY (US);

Rodney A. Kendall, Ridgefield, CT (US);

Werner Stickel, Ridgefield, CT (US);

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:

Whitham, Curtis & Christofferson, P.C.

Primary Examiner:

John R Lee

Assistant Examiner:

David A Vanore

Int. Cl.
CPC ...
H01J 3/14 ; A61N 5/00 ; G21G 5/00 ;
U.S. Cl.
CPC ...
H01J 3/14 ; A61N 5/00 ; G21G 5/00 ;
Abstract

An electronic beam lithography tool providing dimensional stability. The tool includes three or more deflection plates above an aperture diaphragm which allows the beam to be deflected away from an aperture and along a two-dimensional locus on the aperture diaphragm which is approximately symmetrical around the aperture therein. By doing so, the aperture diaphragm is symmetrically heated by the power of the charged particle beam and the geometry of the charged particle beam device is stabilized against variance in geometry of the device to a very small tolerance.

Find Patent Forward Citations

Clement, Clay. (2002). Symmetric blanking for high stability in electron beam exposure systems (U.S. Patent No. 6483117). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6483117

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…